June 2007
Volume 7, Issue 9
Vision Sciences Society Annual Meeting Abstract  |   June 2007
Spatial layout determines metacontrast masking
Author Affiliations
  • Michael Herzog
    Laboratory of Psychophysics, Brain Mind Institute, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland
  • Varinthira Duangudom
    School of Electrical and Computer Engineering, Georgia Institute of Technology (Georgia Tech), Atlanta, GA, USA
  • Greg Francis
    Department of Psychological Sciences, Purdue University, West Lafayette, IN, USA
Journal of Vision June 2007, Vol.7, 1015. doi:10.1167/7.9.1015
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      Michael Herzog, Varinthira Duangudom, Greg Francis; Spatial layout determines metacontrast masking. Journal of Vision 2007;7(9):1015. doi: 10.1167/7.9.1015.

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      © ARVO (1962-2015); The Authors (2016-present)

  • Supplements

In visual backward masking, performance on a target is impeded by a following mask. In B-type masking, strongest masking occurs when the mask trails the target for about 30–80ms. To account for this century old result, all models propose an inhibitory interaction between mask and target based on their energy ratio. Here, we show strong counter-evidence to this proposition. We presented a vernier flanked by aligned verniers. Strongest B-type masking occurred when the flanks had the same length as the vernier. For longer (higher energy) and smaller (lower energy) flanks, performance improved. By further increasing the energy of the mask, we could even almost completely diminish masking. Hence, energy is not the key aspect in masking. We will suggest that the overall spatial layout of the mask is a much better factor to explain metacontrast masking.

Herzog, M. Duangudom, V. Francis, G. (2007). Spatial layout determines metacontrast masking [Abstract]. Journal of Vision, 7(9):1015, 1015a, http://journalofvision.org/7/9/1015/, doi:10.1167/7.9.1015. [CrossRef]

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